Introduction

Intelligent Microelectronics Manufacturing at University of Michigan is a Multidisciplinary Research Program of the University Research Initiative (MURI) sponsored by Air Force Office of Scientific Research and Defense Advanced Research Projects Agency(DARPA).

Research Goals

The MURI Center on Intelligent Microelectronics Manufacturing(Modeling and Control of Plasma Processing) at the University of Michigan started in September 1995. This center is focused on modeling and control of plasma deposition and etching processes. These plasma processes are used extensively in the manufacture of integrated circuits as well as active matrix liquid crystal displays. These application areas motivate our selection of research problems in modeling and control.

The major research agenda is to investigate and demonstrate real-time and run-to-run control of plasma etching and deposition processes. The overarching goal is to develop novel approaches to control of plasma based microelectronics manufacturing processes and quantify the achievable improvements in the key performance parameters of the product (wafer or display) by using model and sensor based control over the current best practice approaches.

In particular, the specific research tasks are as follows:

Modeling

First principles modeling of plasma processes, first principles modeling of metal deposition processes, first principles modeling of optical sensors for wafer level measurements, modeling for RF sensors, statistical modeling for run-to-run control, statistical modeling for feedback variable selection.

In-situ sensors for control

Plasma sensors including optical emission spectroscopy, laser and white light reflectance sensors for thin film thickness and etch rate measurements.

Control

Nonlinear estimators and controllers for real-time in-situ thin film thickness measurements, real-time control of spatial uniformity in large area processing, combined run-to-run and real-time control.

Processes and materials

Improved plasma deposition processes for display applications.