GaAs and InP-based Heterostructure Bipolar Transistors

The objectives under this program are the investigation of HBT transistor designs suitable for high-frequency operation. Both GaAs and InP-based HBTs are studied for this purpose. The theoretical understanding of the devices is supported by transient and steady-state Monte Carlo approaches, simulations of breakdown and distortion properties. Conventional and special collector HBTs are studied. A self-aligned technology using Reactive-Ion-Etching (RIE) has been developed for GaAs as well as InP-based HBTs. Speed-power characterizations and correlations to the theoretical expectations complete the device understanding. Accomplishments made in these areas are given below.




[GaN] [InP] [GaAs] [MOCVD] [Mixer] [Gunn (NDR)] [PIN] [HBTs] [HEMTs] [MMICs]

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