Clean Room


The laboratory offers a full range of process tools, including electron-beam lithography, MBE, MOMBE, MOCVD, ion implantation, and LPCV. This capability is centered in 4,000 square feet of class-100 processing area, with approximately 1000 square feet of class-10 space devoted to submicron lithography.

Facilities

Material Growth Equipment

Processing Equipment

Characterization Equipment

Measurement Equipment


[GaN] [InP] [GaAs] [MOCVD] [Mixer] [Gunn (NDR)] [PIN] [HBTs] [HEMTs] [MMICs]

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Department of Electrical Engineering and Computer Science, University of Michigan

Review of Group Activities

III-V Integrated Devices and Circuits Group

The homepages are maintained by Xin Zhu