Anisotropic Etch Simulator for MEMS

Joe Johnson

About the Event

IntelliSuite was the first MEMS-specific CAD tool and has been under active development for over 20 years. In this webinar, explore and understand how IntelliEtch, a powerful anisotropic etch simulator, can help MEMS designers and process engineers save time and cost in their etching processes while helping professors teach their students about advanced etching techniques. This webinar will cover: simulation of wet etching for silicon and quartz, etching of high-order planes, experimental validation of the program’s accuracy, simulating composite multi-mask MEMS processes, simulation speed enhancement through GPU-based processing, and discussion of the new features and capabilities available in the latest IntelliEtch release.

Biography

Joe Johnson is the Business Development Manager at IntelliSense. He has a broad knowledge base that spans MEMS design, CAD/FEA simulation, and customer education/training. Joe has been instrumental in fostering IntelliSense’s global business relationships and bringing value to IntelliSense’s clients and partners. Joe has extensive CAD expertise and strong mechanical/structural engineering. He has collaborated on a broad array of customer design projects including inertial sensors, thermal actuators, and fluidic devices. Joe holds a degree in Mechanical Engineering from MIT.

Additional Information

Contact: Dr. Behrouz Shiari

Phone: 734-615-4804

Email: bshiari@umich.edu

Sponsor: NNIN Computation Project at Michigan

Open to: Public

Web Page: http://lnf.umich.edu/nnin-at-michigan/index.php/2012/08/anisotropic-wet-etch-simulator-for-mems/