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Direct fabrication of micron-scale structures using Super Inkjet technology

Dr. Kazuhiro Murata

SITechnology, Inc.
Monday, September 17, 2018
10:00am - 11:00am
1340 EECS

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About the Event

We have developed a super-fine inkjet technology (SIJ) that enables extremely fine pattern formation using droplets measuring less than 1 micrometer in diameter. By using conductive ink based on nano-metal particles, direct fabrication of circuits and three-dimensional structures having a feature size of just a few microns are achieved. Moreover the SIJ is capable of printing with a wide variety of inks, for example, insulators, organic semiconductors, light emitting polymers, bio-materials and UV curable polymers. The potential of the SIJ technology and its application to cutting-edge areas, such as flexible electronics, printed electronics, fine interconnect and others will be shown.

Additional Information

Contact: Eva Ruff

Phone: 734.764.1533


Sponsor(s): OCM Group

Faculty Sponsor: Stephen M. Forrest

Open to: Public

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