Run-to-Run (R2R) Control is a form of discrete process and machine control in which the product recipe with respect to a particular machine process is modified ex-situ, i.e., between runs, so as to minimize process drift, shift, and variability. In effect, the inputs and outputs of each process run are taken into account by the R2R controller at the end of each run. From this data, the controller makes adjustments to the process in order to improve the effective output and increase yield at the end of the next run. By repeating this process in between each run, one can minimize process drift. This type of control is a critical component of the hierarchal scheme that is widely suggested for control in the semiconductor manufacturing arena.

IMPACT has developed the Generic Cell Controller (GCC) as part of an implementation of a Run-to-Run control framework for semiconductor manufacturing processes. This generic R2R control framework is one component of a multi-level control system that includes Real-Time Equipment and Inter-Process Control. The framework is compliant with existing trends and standards in the semiconductor manufacturing industry.

People Involved

James Moyne
Victor Solakian
Roland Telefeyan

Publications

Visit our Publications Archive to download more detailed documentation of our research into Run-to-Run control, as well as other control and automation research of the Integrated Manufacturing Process Automation and Control Technologies group. Run-to-Run Control Software Package has been developed and tested on many semiconductor manufacturing tool types.

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