SSEL Facilities


The Michigan Nanofabrication Facility (MNF) consists of a Class 1000/100/10 research laboratory with approximately 6,000 square feet of work area. The research laboratory consists of five process bays (silicon lithography/diffusion, silicon LPCVD, compound semiconductor devices, thin-film deposition, and dry etching) plus five separate, connected rooms for e-beam lithography and metrology (Class 10) and for compound semiconductor materials growth. A separate Class 10,000 instructional laboratory of approximately 1,000 square feet supports formal courses.

Any process facility considered a clean room requires strict operational and environmental specifications: cleanliness, temperature, humidity, make-up air, scrubber exhaust and waste disposal must all be controlled.